6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid [1610827-31-0] - Photo Acid Generator

Product Name: 6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid (6-Bu-NIOTf)

Other Name: 6-butyl-1,3-dioxo-1H-benzo[de]isoquinolin-2(3H)-yl trifluoromethanesulfonate,

Methanesulfonic acid, 1,1,1-trifluoro-, 6-butyl-1,3-dioxo-1H-benz[de] isoquinolin -2(3H)-yl ester

CAS No.: 1610827-31-0

MF: C17H14F3NO5S

MW: 401.36

Pack size: 1G/5G/10G/25G; Bulk in KG

Application: Electronic chemicals; Semiconductor chemicals; Photo-resist; Photoacid Generator, Photo Acid Generator; PAG; Photo curing; UV curable; Light curing; Photo-cure; 3D/4D Printing

CoA of Product：

Product List

Mechanism of Photo Acid Generator of NIOTf. When exposed by a suitable light source, Sulfonate bond will be broken, and considerable amount of Sulfonic Acid can be produced[2].

The mechanism of Photo Acid Generator used in Photo-resist for acid generator and polymer formations[2]

Characteristics of NIOTf.

① Excellent Photo absorption ability; good solubility in organic solvent;High thermal stability; High acid yield,

② Modification and tailoring of structure through chemical synthesis is easy to achieve and control

1, 8-Naphthalimide easily tailored and modified through various chemical synthesis, and its absorption properties will be changed correspondingly. Through the modification of Solubility, Poly-aromatics or Substitution Mode of the Naphthalene Nuclei by chemical engineering, fine-tuning of the photo properties which was desired will be easily obtained (shown in the follow picture), all these making it became a versatile candidate for promising photo Initiators [3].

The different chemical modifications enabling to finely tune the optical properties of 1,8-naphthalimides[3].

^Reference:

^{[1].J. P. Malval et al, J. Phys. Chem. A 2008, 112, 3879-3885}

^{[2]. K. W. et al, WO2019/ 045377 KO 2019 .03 .07}

^{[3]. G. Noirbent et al, European Polymer Journal 2020, 132,109702.}